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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Oxides
A1 Characterization
Spectroscopic ellipsometry
CHLORINE PLASMAS
Chalcogenide
Atomic force microscopy
Chalcogenide glass
Cathepsin
A Chalcogenides
Non-volatile memory
Band alignment
Colloidal solution
Carbon Nanotube
A Thin films
Kirkendall effect
B2 Semiconducting alloys
Resistive switching
Plasmas froids
Aryl-diazonium salts
X-ray diffraction
Scanning electron microscopy
Functionalization
Anatase
Avalanche breakdown
Applications industrielles
AuCu alloy
PECVD
AZO thin films
TiO2
Vanadium Sesquioxide
Atomic layer etching
Thin film
Chemical detection
Aluminium nitride
Ablation laser
Nanotubes
V2O3
Thin films
Mott insulator
Adsorption
TEM
BOMBARDMENT
Structure
NEXAFS
Alloying
Calcined clay
Transfert d'énergie
Biofilms microbiens
Carbon
B Chemical synthesis
Band gap
Low-pressure plasma processing
AlN
Residual stress
CaTiO3Pr^3^+
Capacitance
CIGSe
Etching
CNTs’ collapse
Plasma etching
Amorphous
Physical vapor deposition
Selenization
Amyloid precursor
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Biomasse
Alzheimer's disease
Titanium dioxide
Mott insulators
CH4
B2 Semiconducting indium compounds
SF 6
Copper
Sputtering
B3 Solar cells
Semiconductors
Films
Carbon nitride
XPS
3 nm in size
A-CNx
Bixbyite
Chemical and biological sensors
Optical properties
Carbon nanotubes
Biocapteurs
B2 Quaternary
A3 Physical vapor deposition processes
Buffer Couple
A Multilayers
Magnetron sputtering
Ambipolar material
Sol-gel
Chalcogenides
Bipolar resistive switching BRS
Transmission electron microscopy
C Photoelectron spectroscopy
X-ray photoelectron spectroscopy
Nanocomposite
B1 Inorganic compounds